High-k Materials in Multi-Gate FET Devices / edited by Shubham Tayal, Parveen Singla, and J. Paulo Davim.
Contributor(s): Tayal, Shubham [editor.]
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Material type: 
BookSeries: Science, technology, and management.Publisher: Boca Raton : CRC Press, 2021Description: 1 online resource.Content type: text Media type: computer Carrier type: online resourceISBN: 9781003121589; 1003121586; 9781000438819; 1000438813; 9781000438789; 1000438783.Subject(s): Electrochemistry | TECHNOLOGY / Electronics / MicroelectronicsDDC classification: 537/.24 Online resources: Taylor & Francis | OCLC metadata license agreement Summary: "This book focuses on high-k materials for advanced FET devices. It discusses emerging challenges in the engineering and applications and considers issues with associated technologies. This work will be of high interest to researchers in materials science, electronics engineering, IT, and related disciplines studying nanodevices such as FinFET and Tunnel FET and device-circuit codesign issues"-- Provided by publisher.
"This book focuses on high-k materials for advanced FET devices. It discusses emerging challenges in the engineering and applications and considers issues with associated technologies. This work will be of high interest to researchers in materials science, electronics engineering, IT, and related disciplines studying nanodevices such as FinFET and Tunnel FET and device-circuit codesign issues"-- Provided by publisher.
OCLC-licensed vendor bibliographic record.
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