Reliability wearout mechanisms in advanced CMOS technologies / 
Alvin W. Strong ... [et al.]. 
 - 1 PDF (xv, 624 pages) :  illustrations. 
 - IEEE Press series on microelectronic systems ;  12 .
 - IEEE Press Series on Microelectronic Systems ;  12 .
<br/><br/>Includes bibliographical references and index. 
<br/><br/>Introduction / Alvin W. Strong -- Dielectric characterization and reliability methodology / Ernest Y. Wu, Rolf-Peter Vollertsen, and Jordi Su�n�e -- Dielectric breakdown of gate oxides: physics and experiments / Ernest Y. Wu, Rolf-Peter Vollertsen, and Jordi Su�n�e -- Negative bias temperature instabilities in pMOSFET devices / Giuseppe LaRosa -- Hot carriers / Stewart E. Rauch, III -- Stress-induced voiding / Timothy D. Sullivan -- Electromigration / Timothy D. Sullivan. 
<br/><br/> Restricted to subscribers or individual electronic text purchasers. 
<br/><br/><br/>Mode of access: World Wide Web. 
<br/><br/><label>ISBN: </label>9780470455265 
<br/><br/><label>Standard No.: </label>10.1002/9780470455265  doi 
<br/><br/><label>LCCN: </label>
<br/><br/><label>Nat. Bib. No.: </label>
<br/><br/><label>Nat. Bib. Agency Control No.: </label>
<br/><br/><label>Subjects--Topical Terms: </label><br/>Metal oxide semiconductors, Complementary--Reliability.
<br/><br/><label>Index Terms--Genre/Form: </label><br/>Electronic books.
<br/><br/><label>LC Class. No.: </label>TK7871.99.M44  / R455 2009eb