000 03396nam a22004935i 4500
001 978-3-319-67870-2
003 DE-He213
005 20220801221307.0
007 cr nn 008mamaa
008 171030s2018 sz | s |||| 0|eng d
020 _a9783319678702
_9978-3-319-67870-2
024 7 _a10.1007/978-3-319-67870-2
_2doi
050 4 _aTK7867-7867.5
072 7 _aTJFC
_2bicssc
072 7 _aTEC008010
_2bisacsh
072 7 _aTJFC
_2thema
082 0 4 _a621.3815
_223
100 1 _aFreeman, Yuri.
_eauthor.
_4aut
_4http://id.loc.gov/vocabulary/relators/aut
_955197
245 1 0 _aTantalum and Niobium-Based Capacitors
_h[electronic resource] :
_bScience, Technology, and Applications /
_cby Yuri Freeman.
250 _a1st ed. 2018.
264 1 _aCham :
_bSpringer International Publishing :
_bImprint: Springer,
_c2018.
300 _aXIX, 120 p. 109 illus., 57 illus. in color.
_bonline resource.
336 _atext
_btxt
_2rdacontent
337 _acomputer
_bc
_2rdamedia
338 _aonline resource
_bcr
_2rdacarrier
347 _atext file
_bPDF
_2rda
505 0 _aIntroduction -- Chap1:  Major Degradation Mechanisms -- Chap2: Basic Technology -- Chap3: Applications -- Conclusion.
520 _aThis book provides a comprehensive analysis of the science, technology, and applications of Tantalum and Niobium-based capacitors. The author discusses fundamentals, focusing on thermodynamic stability, major degradation processes and conduction mechanisms in the basic structure of Me-Me2O5-cathode (Me: Ta, Nb). Technology-related coverage includes chapters technology chapters on the major manufacturing steps from capacitor grade powder to the testing of finished capacitors. Applications discussed include high reliability, high charge and energy efficiency, high working voltages, high temperatures, etc. The links between the scientific foundation, breakthrough technologies and outstanding performance and reliability of the capacitors are demonstrated.  The theoretical models discussed include the thermodynamics of the amorphous dielectrics, conduction mechanisms in metal-insulator-semiconductor (MIS) structures, band diagrams of the organic semiconductors, etc. Provides a single-source reference to the science, technology, and applications of Tantalum and Niobium-based capacitors; Focuses on Polymer Tantalum capacitors, with rapidly growing applications in special and commercial electronics; Discusses in detail conduction and degradation mechanisms in amorphous dielectrics and multilayer capacitor structures with amorphous dielectrics, such as metal-insulator-semiconductor (MIS) structures with inorganic and organic semiconductors, as well as MOSFET transistors with high k dielectrics.
650 0 _aElectronic circuits.
_919581
650 0 _aElectronics.
_93425
650 1 4 _aElectronic Circuits and Systems.
_955198
650 2 4 _aElectronics and Microelectronics, Instrumentation.
_932249
710 2 _aSpringerLink (Online service)
_955199
773 0 _tSpringer Nature eBook
776 0 8 _iPrinted edition:
_z9783319678696
776 0 8 _iPrinted edition:
_z9783319678719
776 0 8 _iPrinted edition:
_z9783319885001
856 4 0 _uhttps://doi.org/10.1007/978-3-319-67870-2
912 _aZDB-2-ENG
912 _aZDB-2-SXE
942 _cEBK
999 _c79507
_d79507