000 | 02315nam a2200337 i 4500 | ||
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001 | CR9780511794490 | ||
003 | UkCbUP | ||
005 | 20230516164912.0 | ||
006 | m|||||o||d|||||||| | ||
007 | cr|||||||||||| | ||
008 | 141103s2014||||enk o ||1 0|eng|d | ||
020 | _a9780511794490 (ebook) | ||
020 | _z9781107005938 (hardback) | ||
040 |
_aUkCbUP _beng _erda _cUkCbUP |
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050 | 0 | 0 |
_aTK7871.99.M44 _bE54 2014 |
082 | 0 | 0 |
_a621.3815/28 _223 |
100 | 1 |
_aEngström, Olof, _eauthor. _968048 |
|
245 | 1 | 4 |
_aThe MOS system / _cOlof Engström, Chalmers University of Technology, Sweden. |
264 | 1 |
_aCambridge : _bCambridge University Press, _c2014. |
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300 |
_a1 online resource (355 pages) : _bdigital, PDF file(s). |
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336 |
_atext _btxt _2rdacontent |
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337 |
_acomputer _bc _2rdamedia |
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338 |
_aonline resource _bcr _2rdacarrier |
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500 | _aTitle from publisher's bibliographic system (viewed on 05 Oct 2015). | ||
520 | _aThis detailed and up-to-date guide to modern MOS structures describes important tools, cutting-edge models, novel phenomena and current challenges in measuring and improving the control of future MOS systems for transistor channels. Building up from basic electrostatics, it introduces the ideal MOS system, physical and electrical properties of high-k oxides, their dielectric constants, and energy offsets to semiconductors and metals, before moving on to electrical and physical characterization methods for high-k dielectric materials. Finally, real MOS systems are introduced: high-k dielectrics and interlayers, the influence of phonon dynamics, interface states and bulk traps, effective metal work functions, gate leakage phenomena and high mobility channel materials. Abstract concepts are supported by practical examples and critical comparison, encouraging an intuitive understanding of the principles at work, and presented alongside recent theoretical and experimental results, making this the ideal companion for researchers, graduate students and industrial development engineers working in nanoelectronics. | ||
650 | 0 |
_aMetal oxide semiconductors _xMathematical models. _968049 |
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650 | 0 |
_aSemiconductors _xMathematical models. _968050 |
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776 | 0 | 8 |
_iPrint version: _z9781107005938 |
856 | 4 | 0 | _uhttps://doi.org/10.1017/CBO9780511794490 |
942 | _cEBK | ||
999 |
_c82222 _d82222 |