Reliability wearout mechanisms in advanced CMOS technologies /
Alvin W. Strong ... [et al.].
- 1 PDF (xv, 624 pages) : illustrations.
- IEEE Press series on microelectronic systems ; 12 .
- IEEE Press Series on Microelectronic Systems ; 12 .
Includes bibliographical references and index.
Introduction / Alvin W. Strong -- Dielectric characterization and reliability methodology / Ernest Y. Wu, Rolf-Peter Vollertsen, and Jordi Su�n�e -- Dielectric breakdown of gate oxides: physics and experiments / Ernest Y. Wu, Rolf-Peter Vollertsen, and Jordi Su�n�e -- Negative bias temperature instabilities in pMOSFET devices / Giuseppe LaRosa -- Hot carriers / Stewart E. Rauch, III -- Stress-induced voiding / Timothy D. Sullivan -- Electromigration / Timothy D. Sullivan.
Restricted to subscribers or individual electronic text purchasers.
Mode of access: World Wide Web.
9780470455265
10.1002/9780470455265 doi
Metal oxide semiconductors, Complementary--Reliability.
Electronic books.
TK7871.99.M44 / R455 2009eb
Includes bibliographical references and index.
Introduction / Alvin W. Strong -- Dielectric characterization and reliability methodology / Ernest Y. Wu, Rolf-Peter Vollertsen, and Jordi Su�n�e -- Dielectric breakdown of gate oxides: physics and experiments / Ernest Y. Wu, Rolf-Peter Vollertsen, and Jordi Su�n�e -- Negative bias temperature instabilities in pMOSFET devices / Giuseppe LaRosa -- Hot carriers / Stewart E. Rauch, III -- Stress-induced voiding / Timothy D. Sullivan -- Electromigration / Timothy D. Sullivan.
Restricted to subscribers or individual electronic text purchasers.
Mode of access: World Wide Web.
9780470455265
10.1002/9780470455265 doi
Metal oxide semiconductors, Complementary--Reliability.
Electronic books.
TK7871.99.M44 / R455 2009eb